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GEMINI ALD SYSTEM
PEALD 系統(tǒng)設(shè)備 GEMINI ALD SYSTEM - 應(yīng)用于淀積 ALD氧化(Oxide)薄膜，氮化硅(SiN)薄膜等多種薄膜 為多圖案應(yīng)用提供高質(zhì)量保真和非常均勻的薄膜解決方案， 在形成多個(gè)圖案化膜 (例如SADP和SAQP)時(shí)的沉積過(guò)程起到關(guān)鍵作用 憑借其小尺寸，性能優(yōu)于許多具有高UPEH和極端均勻性控制的競(jìng)爭(zhēng)對(duì)手 提供各種旋鈕，用于地圖輪廓控制和簡(jiǎn)單的溫度變化過(guò)程，無(wú)需任何硬件修改 具有優(yōu)異的薄膜均勻性、高吞吐量，產(chǎn)能高和卓越的階梯覆蓋率
Process
-ALD Oxide
-SiN _ Ternary oxide
Applications
- Patterning (Spacer for SADP/QP)
- Hardmask
- Liner
- Gap fill
Introduction.Deposition process in forming multiple patterning films such as SADP and SAQP plays a key role as it defines critical dimensions.GEMINI ALD SYSTEM provides solution for multi-patterning applications with high-quality conformal and very uniform films.
With its small foot print it outperforms many of its competitor models with high UPEH and extreme uniformity control.It also provides various knobs for map profile control and easy process temperature changes without hardware modifications.
Technology.High etch selectivity, smooth film surface, adjustable film stress are controled by composition rate .
Features.
1. Carefully designed chamber, swappable process kits and pumping system for minimal defect and easy maintenance.
2. Edge and backside control by edge flow and vacuum chucking system: Less edge defect and more DOF margin.
